Spreading Resistance Profiling

Maps how doping concentration changes with depth beneath a semiconductor surface, by measuring electrical resistance at a series of points along a shallow, precisely angled bevel cut into the material.

References

• Schumann, J., Probst, R., Ranzinger, G. "Spreading Resistance Profiling." Journal of Electrochemical Society 137, no. 3 (1990): 945–951.